The 10QM20UF.F55 is a low GDD Ytterbium Laser Mirror optimized for 505-530 nm. Made out of fused silica, the mirror size is 25.4 mm in diameter and 6.35 mm thick. This ultrafast mirror is ideal as a high reflectance steering mirror for Ytterbium lasers at 45 angle of incidence. Careful thin film design and advanced coating processes result in a mirror with maximum reflectivity with minimum effect on pulse dispersion.
Технические характеристики
- Wavelength Region VIS
- Wavelength Range 505-530 nm
- Mirror Shape Round
- Diameter 25.4 mm
- Material UV Grade Fused Silica
- Coating Type Laser Line Ultrafast Dielectric
- Coating Code UF.F55
- Surface Quality 10-5 scratch-dig
- Surface Flatness λ/10 at 632.8 nm
- Wedge ≤ 3 arc min
- Angle of Incidence 45°
- Clear Aperture ≥central 80% of diameter
- Back Surface Commercial Polished
- Reflectivity Rp, Rs > 99.5% @ 505-530 nm
- Thickness 6.35 mm
- Thickness Tolerance ±0.5 mm
- Diameter Tolerance +0/-0.25 mm
- Chamfers 0.25–0.75 mm face width
- Chamfers Angle Tolerance 45° ±15°
- Cleaning See How to Clean Optics
