The TruPlasma Bipolar Series 4000 (G2.1) process power supplies were specifically designed for plasma-assisted coating using PVD, PECVD, and reactive sputtering processes. With their flexible formable output signals and sophisticated arc management, they deliver excellent results in the manufacture of solar cells and semi-conductors, the deposition of decorative and wear-resistant layers, and the coating of architectural glass. Extremely low arc energy Fully digital arc management for the highest coating quality and productivity. Configurable wave forms Simple adjustment to various processes by varying the output signal. One generator, numerous applications DC, pulsed DC, and bipolar: Save on costs due to diverse settings. Integrated water cooler No external components are required, meaning it only requires a small amount of space.
Технические характеристики
CharacteristicsOther caracteristicPECVD, PVD
